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Browsing by Author "Sewell, Harry"

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    Status 157nm lithography development at IMEC

    Ronse, Kurt  
    ;
    De Bisschop, Peter  
    ;
    Eliat, Astrid
    ;
    Goethals, Mieke
    ;
    Hermans, Jan  
    ;
    Jonckheere, Rik  
    Proceedings paper
    2003, Optical Microlithography XVI, 23/02/2003, p.640-649

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