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Status 157nm lithography development at IMEC
Publication:
Status 157nm lithography development at IMEC
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Date
2003
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Ronse, Kurt
;
De Bisschop, Peter
;
Eliat, Astrid
;
Goethals, Mieke
;
Hermans, Jan
;
Jonckheere, Rik
;
Van Den Heuvel, Dieter
;
Van Roey, Frieda
;
Beckx, Stephan
;
Wouters, Jan
;
de Marneffe, Jean-Francois
;
O'Neil, Timothy
;
Tirri, Bruce
;
Sewell, Harry
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Views
1904
since deposited on 2021-10-15
1
last month
1
last week
Acq. date: 2025-12-10
Citations