Publication:

Status 157nm lithography development at IMEC

Date

2003
Proceedings Paper
Simple item page Full metadata Statistics
 
dc.contributor.authorRonse, Kurt
dc.contributor.authorDe Bisschop, Peter
dc.contributor.authorEliat, Astrid
dc.contributor.authorGoethals, Mieke
dc.contributor.authorHermans, Jan
dc.contributor.authorJonckheere, Rik
dc.contributor.authorVan Den Heuvel, Dieter
dc.contributor.authorVan Roey, Frieda
dc.contributor.authorBeckx, Stephan
dc.contributor.authorWouters, Jan
dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorO'Neil, Timothy
dc.contributor.authorTirri, Bruce
dc.contributor.authorSewell, Harry
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorDe Bisschop, Peter
dc.contributor.imecauthorHermans, Jan
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorVan Den Heuvel, Dieter
dc.contributor.imecauthorVan Roey, Frieda
dc.contributor.imecauthorBeckx, Stephan
dc.contributor.imecauthorWouters, Jan
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.contributor.orcidimecHermans, Jan::0000-0003-1249-8902
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.date.accessioned2021-10-15T06:25:06Z
dc.date.available2021-10-15T06:25:06Z
dc.date.embargo9999-12-31
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8081
dc.source.beginpage640
dc.source.conferenceOptical Microlithography XVI
dc.source.conferencedate23/02/2003
dc.source.conferencelocationSanta CLara, CA usa
dc.source.endpage649
dc.title

Status 157nm lithography development at IMEC

dc.typeProceedings paper
dspace.entity.typePublication
Files

Original bundle

Name:
7600.pdf
Size:
1.7 MB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Conference contributions