Repository logo Institutional repository
  • Communities & Collections
  • Browse
  • Site
Search repository
High contrast
  1. Home
  2. Browse by Author

Browsing by Author "Siebert, Joachim"

Filter results by typing the first few letters
Now showing 1 - 1 of 1
  • Results Per Page
  • Sort Options
  • Loading...
    Thumbnail Image
    Publication

    Calibration and verification of a stochastic model for EUV resist

    Gao, Weimin
    ;
    Philippou, Alexander
    ;
    Klostermann, Ulrich
    ;
    Siebert, Joachim
    ;
    Philipsen, Vicky  
    Proceedings paper
    2012, Extreme Ultraviolet (EUV) Lithography III, 12/02/2012, p.83221D

Follow imec on

VimeoLinkedInFacebook

The repository

  • Contact us
  • Policy
  • About imec
Privacy statement | Cookie settings