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Browsing by Author "Simms, Ihsan"

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    Development of integrated wet cleans for 3D-SIC technologies

    Suhard, Samuel  
    ;
    Simms, Ihsan
    ;
    Brown, Ian
    ;
    Shogo, Mizota
    ;
    Koji, Kagawa
    ;
    Claes, Martine  
    Proceedings paper
    2013, Ultra Clean Processing of Semiconductor Surfaces XI - UCPSS, 17/09/2012, p.150-153
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    Focus spot reduction by brush scrubber cleaning

    Pacco, Antoine  
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    Kesters, Els  
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    Simms, Ihsan
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    Nafus, Kathleen  
    ;
    Vandereyken, Jelle  
    Proceedings paper
    2014, Ultra Clean Processing of Semiconductor Surfaces - UCPSS XII, 22/09/2014, p.276-279
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    Partial wetting of aqueous solutions on high aspect ratio nanopillars with hydrophilic surface finish

    Vereecke, Guy  
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    Xu, XiuMei  
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    Tsai, W.K.
    ;
    Yang, Hui
    ;
    Armini, Silvia  
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    Delande, Tinne  
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    Doumen, Geert  
    Journal article
    2014, ECS Journal of Solid State Science and Technology, (3) 1, p.N3095-N3100
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    UV-induced modification of fluorocarbon polymer for improvement of wet removal

    Le, Quoc Toan  
    ;
    Simms, Ihsan
    ;
    Yue, Henry
    ;
    Brown, Ian
    ;
    Kesters, Els  
    ;
    Struyf, Herbert  
    ;
    De Gendt, Stefan  
    Meeting abstract
    2012, Sematech Surface Preparation and Cleaning Conference - SPCC, 19/03/2012
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    UV-induced modification of fluorocarbon polymer for improvement of wet removal

    Le, Quoc Toan  
    ;
    Simms, Ihsan
    ;
    Yue, Henry
    ;
    Brown, Ian
    ;
    Kesters, Els  
    ;
    Vereecke, Guy  
    ;
    Struyf, Herbert  
    Journal article
    2014, Microelectronic Engineering, 114, p.136-140
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    Wet removal of post-etch residues by a combination of UV irradiation and a SC1 process

    Kesters, Els  
    ;
    Le, Quoc Toan  
    ;
    Simms, Ihsan
    ;
    Nafus, Kathleen  
    ;
    Struyf, Herbert  
    ;
    De Gendt, Stefan  
    Proceedings paper
    2013, Ultra Clean Processing of Semiconductor Surfaces XI - UCPSS, 17/09/2012, p.114-118
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    Wetting behavior of aqueous solutions on high aspect ratio nanopillars with hydrophilic surface finish

    Vereecke, Guy  
    ;
    Xu, XiuMei  
    ;
    Tsai, Wei-Kang
    ;
    Yang, Hui
    ;
    Armini, Silvia  
    ;
    Delande, Tinne  
    ;
    Doumen, Geert  
    Proceedings paper
    2013, Semiconductor Cleaning Science and Technology 13, 27/10/2013, p.171-182

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