Browsing by Author "Smith, Mark"
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Publication DSA graphoepitaxy calibrations for contact hole multiplication
Proceedings paper2015, Advances in Patterning Materials and Processes XXXII, 22/02/2015, p.94250YPublication Impact of mask three dimensional effects on resist-model calibration
Journal article2009, Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3 Letters), (8) 3, p.30501Publication Statistical simulation of resist at EUV and ArF
Proceedings paper2009, Advances in Resist Materials and Processing Technology XXVI, 22/02/2009, p.727319Publication Stochastic and systematic patterning failure mechanisms for contact-holes in EUV lithography: part 2
Proceedings paper2014, Extreme Ultraviolet (EUV) Lithography V, 23/02/2014, p.904834