Publication:

Impact of mask three dimensional effects on resist-model calibration

Date

2009
Journal article
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17934.pdf 379.52 KB

Author(s)

De Bisschop, Peter  
;
Muelders, Thomas
;
Klostermann, Ulrich
;
Schmoeller, Thomas
;
Biafore, John
;
Robertson, Stewart A.
;
Smith, Mark

Journal

Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3 Letters)

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1925 since deposited on 2021-10-17
Acq. date: 2025-10-24

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