Browsing by Author "Snijders, J.H.M."

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Plasma-nitrided silicon-rich oxide as an extension to ultrathin nitrided oxide gate dielectrics

Cubaynes, F.N.
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Venezia, V.C.
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van der marel, C.
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Snijders, J.H.M.
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Everaert, Jean-Luc
Journal article
2005, Applied Physics Letters, (86) 17, p.172903-1-172903-3
Properties of HfTaxOy high-k layers deposited by ALCVD

Zhao, Chao
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Rittersma, Z.M.
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van Berkum, J.G.M.
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Snijders, J.H.M.
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Hendriks, A.
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Breimer, P.
Proceedings paper
2005, Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS: New Materials, Processes, and Equipment, 15/05/2005, p.133-140