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Browsing by Author "Sorensen, Jacob"

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    Accurate models for EUV simulation and their use for design correction

    Lorusso, Gian  
    ;
    Hermans, Jan  
    ;
    Baudemprez, Bart  
    ;
    Hendrickx, Eric  
    ;
    Klostermann, Ulrich K.
    Proceedings paper
    2009, International Symposium on Extreme Ultraviolet Lithography, 18/10/2009
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    EUV modeling accruracy and integration requirements for the 16nm node

    Zavyalova, Lena
    ;
    Su, Irene
    ;
    Jang, Stephen
    ;
    Cobb, Jonathan
    ;
    Ward, Brian
    ;
    Sorensen, Jacob
    ;
    Song, Hua
    Proceedings paper
    2010, Extreme Ultraviolet (EUV) Lithography, 21/02/2010, p.763627

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