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Browsing by Author "Sorsch, T."

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    Nucleation and growth of atomic layer deposited HfO2 gate dielectric layers on chemical oxide (Si-O-H) and thermal oxide (SiO2 or Si-O-N)

    Green, Martin
    ;
    Ho, M.Y.
    ;
    Busch, B.
    ;
    Wilk, G.D.
    ;
    Sorsch, T.
    ;
    Conard, Thierry  
    ;
    Brijs, Bert
    Journal article
    2002, Journal of Applied Physics, (92) 12, p.7168-7172

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