Browsing by Author "Torres, Andres"
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Publication Complementary dipole exposure solutions at 0.29k1
Proceedings paper2005, Optical Microlithography XVIII, 27/02/2005, p.327-338Publication Defect printability for 100-nm design rule using 193nm lithography
Proceedings paper2002, Photomask and Next-Generation Lithography Mask Technology IX, 23/04/2002, p.640-651Publication Double-patterning decomposition, design compliance, and verification algorithms at 32nm hp
Publication Physically-based compact models for fast lithography simulation
Publication Source polarization and OPC effects on illumination optimization
Publication Validation of improved compact model in grapho-epitaxy Directed-Self-Assembly (DSA)
Proceedings paper2015, 1st International Symposium on DSA, 26/10/2015