Repository logo Institutional repository
  • Communities & Collections
  • Scientific publicationsOpen knowledge
Search repository
High contrast
  1. Home
  2. Browse by Author

Browsing by Author "Tsunoda, Dai"

Filter results by typing the first few letters
Now showing 1 - 1 of 1
  • Results per page
  • Sort Options
  • Loading...
    Thumbnail Image
    Publication

    Mask Contribution to OPC Model Accuracy

    Lyons, Adam
    ;
    Wallow, Tom
    ;
    Hennerkes, Christoph
    ;
    Spence, Chris
    ;
    Delorme, Max  
    ;
    Rio, David  
    Proceedings paper
    2020, Conference on Extreme Ultraviolet Lithography, SEP 21-25, 2020, p.115171D

Follow imec on

VimeoLinkedInFacebook

The repository

  • Contact us
  • Policy
  • About imec
Privacy statement | Cookie settings