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Browsing by Author "Van Adrichem, P."

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    Publication

    Extending 0.33NA EUVL to 28 nm pitch using alternative mask and controlled aberrations

    Rio, D.
    ;
    Van Adrichem, P.
    ;
    Delorme, M.
    ;
    Lyakhova, K.
    ;
    Spence, C.
    ;
    Franke, Joern-Holger
    Proceedings paper
    2021, Conference on Extreme Ultraviolet (EUV) Lithography XII, FEB 22-26, 2021, p.116090T

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