Browsing by Author "Van Adrichem, P."
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Publication Extending 0.33NA EUVL to 28 nm pitch using alternative mask and controlled aberrations
;Rio, D. ;Van Adrichem, P. ;Delorme, M. ;Lyakhova, K. ;Spence, C.Franke, Joern-HolgerProceedings paper2021, Conference on Extreme Ultraviolet (EUV) Lithography XII, FEB 22-26, 2021, p.116090T