Publication:
Extending 0.33NA EUVL to 28 nm pitch using alternative mask and controlled aberrations
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1791 since deposited on 2022-03-11
1last month
Acq. date: 2025-12-10
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Metrics
Views
1791 since deposited on 2022-03-11
1last month
Acq. date: 2025-12-10
Citations