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Browsing by Author "Van Peski, C."

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    Hard pellicle investigation for 157 nm lithography: impact on overlay

    Bruls, R.
    ;
    Uitterdijk, T.
    ;
    Cicilia, O.
    ;
    De Bisschop, Peter  
    ;
    Kocsis, Michael  
    ;
    Grenville, A.
    Proceedings paper
    2004, 20th European Mask Conference on Mask Technology for Integrated Circuits and Microcomponents, 12/01/2004, p.1-11
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    Initial assessment of the impact of a hard pellicle on imaging using a 193 nm step-and-scan system

    De Bisschop, Peter  
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    Kocsis, Michael  
    ;
    Bruls, R.
    ;
    Van Peski, C.
    ;
    Grenville, A.
    Journal article
    2004, Journal of Microlithography, Microfabrication and Microsystems, (3) 2, p.239-262
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    Initial assessment of the lithographic impact of the use of a hard pellicle on wafer distortion

    Kocsis, Michael  
    ;
    De Bisschop, Peter  
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    Bruls, R.
    ;
    Grenville, A.
    ;
    Van Peski, C.
    Proceedings paper
    2004, Optical Microlithography XVII, 22/02/2004, p.1679-1688
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    Initial assessment of the lithographic impact of the use of hard pellicles : an overview

    De Bisschop, Peter  
    ;
    Kocsis, Michael  
    ;
    Bruls, R.
    ;
    Grenville, A.
    ;
    Van Peski, C.
    Proceedings paper
    2004, Optical Microlithography XVII, 22/02/2004, p.116-123

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