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Browsing by Author "Vankerckhoven, H."

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    Can we increase the efficiency of organic contamination removal by ozone/Di-water processes by using additives?

    De Smedt, Frank
    ;
    Vankerckhoven, H.
    ;
    De Gendt, Stefan  
    ;
    Heyns, Marc  
    ;
    Vinckier, Chris
    Proceedings paper
    2003, Ultra Clean Processing of Silicon Surfaces 2002 - UCPSS, 16/09/2002, p.215-219
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    Determination of photoresist degradation products in O-3/DI processing

    Vankerckhoven, H.
    ;
    De Smedt, F.
    ;
    Van Herp, B.
    ;
    Claes, Martine  
    ;
    De Gendt, Stefan  
    ;
    Heyns, Marc  
    Journal article
    2002, Ozone Science and Engineering, (24) 5, p.391-398
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    Effect of additives on the removal efficiency of photoresist by ozone/Di-water processes; experimental study

    Vankerckhoven, H.
    ;
    De Smedt, Frank
    ;
    Claes, Martine  
    ;
    De Gendt, Stefan  
    ;
    Heyns, Marc  
    ;
    Vinckier, Chris
    Proceedings paper
    2003, Ultra Clean Processing of Silicon Surfaces 2002 - UCPSS, 16/09/2002, p.101-105
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    The increasing importance of the use of ozone in the microelectronics industry

    De Smedt, F.
    ;
    De Gendt, Stefan  
    ;
    Claes, Martine  
    ;
    Heyns, Marc  
    ;
    Vankerckhoven, H.
    ;
    Vinckier, Chris
    Journal article
    2002, Ozone Science and Engineering, (24) 5, p.379-390

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