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Browsing by Author "Vockenhuber, Michaela"

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    Photosensitized Chemically Amplified Resist (PSCAR) 2.0 for high-throughput and high-resolution EUV lithography: dual photosensitization of acid generation and quencher decomposition by flood exposure

    Nagahara, Seiji
    ;
    Carcasi, Michael
    ;
    Shiraishi, Gosuke
    ;
    Nakagawa, Hisashi
    ;
    Dei, Satoshi
    Proceedings paper
    2017, Advances in Patterning Materials and Processes XXXIV, 26/02/2017, p.101460G

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