Browsing by Author "Wakefield, Clare"
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Publication Impact of AAPSM etch depth linearity in ArF immersion lithography
Proceedings paper2005, 2nd International Symposium on Immersion Lithography, 12/09/2005Publication Through-pitch characterization and printability for 65nm half-pitch alternating aperture phase shift applications
Proceedings paper2005, Photomask and Next-Generation Lithography Mask Technology XII, 13/04/2005, p.211-222