Browsing by Author "Wang, Erik"
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Publication Limitation of EUV single exposure on DRAM applications: learning and challenges
Oral presentation2022-06-15, ASML Technology Conference 2022Publication Metal layer single EUV expose at pitch 28nm: how bright field and NTD resist advantages align
Proceedings paper2021, Conference on Extreme Ultraviolet (EUV) Lithography XII, FEB 22-26, 2021, p.116090RPublication Tomorrow's pitches on today's 0.33 NA scanner: pupil and imaging conditions to print P24 L/S and P28 contact holes
Proceedings paper2020, Extreme Ultraviolet Lithography 2020, 21/09/2020, p.1151716