Publication:

Metal layer single EUV expose at pitch 28nm: how bright field and NTD resist advantages align

Date

2021

Proceedings Paper

https://doi.org/10.1117/12.2584733

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Author(s)

Franke, Joern-Holger

;

Frommhold, Andreas

;

Davydova, Natalia

;

;

Nair, Vineet Vijayakrishnan

;

Kovalevich, Tatiana

;

;

;

;

Rispens, Gijsbert

;

;

Hendrickx, Eric

Journal

Proceedings of SPIE

Statistics

1895 since deposited on 2022-03-11

Acq. date: 2026-06-02