Skip to content
Institutional repository
Communities & Collections
Browse
Site
Log In
imec Publications
Conference contributions
Metal layer single EUV expose at pitch 28nm: how bright field and NTD resist advantages align
Publication:
Metal layer single EUV expose at pitch 28nm: how bright field and NTD resist advantages align
Date
2021
Proceedings Paper
https://doi.org/10.1117/12.2584733
Simple item page
Full metadata
Statistics
Loading...
Loading...
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Franke, Joern-Holger
;
Frommhold, Andreas
;
Davydova, Natalia
;
Aubert, Remko
;
Nair, Vineet Vijayakrishnan
;
Kovalevich, Tatiana
;
Rio, David
;
Bekaert, Joost
;
Wang, Erik
;
Rispens, Gijsbert
;
Maslow, Mark
;
Hendrickx, Eric
Journal
Proceedings of SPIE
Abstract
Description
Metrics
Views
1885
since deposited on 2022-03-11
Acq. date: 2025-10-23
Citations
Metrics
Views
1885
since deposited on 2022-03-11
Acq. date: 2025-10-23
Citations