Publication:
Metal layer single EUV expose at pitch 28nm: how bright field and NTD resist advantages align
| dc.contributor.author | Franke, Joern-Holger | |
| dc.contributor.author | Frommhold, Andreas | |
| dc.contributor.author | Davydova, Natalia | |
| dc.contributor.author | Aubert, Remko | |
| dc.contributor.author | Nair, Vineet Vijayakrishnan | |
| dc.contributor.author | Kovalevich, Tatiana | |
| dc.contributor.author | Rio, David | |
| dc.contributor.author | Bekaert, Joost | |
| dc.contributor.author | Wang, Erik | |
| dc.contributor.author | Rispens, Gijsbert | |
| dc.contributor.author | Maslow, Mark | |
| dc.contributor.author | Hendrickx, Eric | |
| dc.contributor.imecauthor | Franke, Joern-Holger | |
| dc.contributor.imecauthor | Frommhold, Andreas | |
| dc.contributor.imecauthor | Aubert, Remko | |
| dc.contributor.imecauthor | Nair, Vineet Vijayakrishnan | |
| dc.contributor.imecauthor | Kovalevich, Tatiana | |
| dc.contributor.imecauthor | Bekaert, Joost | |
| dc.contributor.imecauthor | Hendrickx, Eric | |
| dc.contributor.orcidimec | Franke, Joern-Holger::0000-0002-3571-1633 | |
| dc.contributor.orcidimec | Frommhold, Andreas::0000-0001-6824-5643 | |
| dc.contributor.orcidimec | Nair, Vineet Vijayakrishnan::0000-0002-8970-2425 | |
| dc.contributor.orcidimec | Bekaert, Joost::0000-0003-3075-3479 | |
| dc.date.accessioned | 2022-03-11T13:36:55Z | |
| dc.date.available | 2022-03-11T13:36:55Z | |
| dc.date.issued | 2021 | |
| dc.identifier.doi | 10.1117/12.2584733 | |
| dc.identifier.eisbn | 978-1-5106-4052-8 | |
| dc.identifier.isbn | 978-1-5106-4051-1 | |
| dc.identifier.issn | 0277-786X | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/39414 | |
| dc.publisher | SPIE-INT SOC OPTICAL ENGINEERING | |
| dc.source.beginpage | 116090R | |
| dc.source.conference | Conference on Extreme Ultraviolet (EUV) Lithography XII | |
| dc.source.conferencedate | FEB 22-26, 2021 | |
| dc.source.conferencelocation | Virtual | |
| dc.source.journal | Proceedings of SPIE | |
| dc.source.numberofpages | 20 | |
| dc.source.volume | 11609 | |
| dc.title | Metal layer single EUV expose at pitch 28nm: how bright field and NTD resist advantages align | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
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