imec Institutional Repository Browsing {{ collection }} by Author "Ward, Brian"

Publication

Checking design conformance and optimizing manufacturability using automated double-patterning decomposition

Cork, Christopher M.

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Ward, Brian

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Barnes, Levi D.

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Painter, Ben

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Lucas, Kevin

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Luk-Pat, Gerry

Proceedings paper

2008, Design for Manufacturability through Design-Process Integration II, 24/02/2008, p.69251Q

Publication

EUV modeling accruracy and integration requirements for the 16nm node

Zavyalova, Lena

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Su, Irene

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Jang, Stephen

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Cobb, Jonathan

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Ward, Brian

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Sorensen, Jacob

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Song, Hua

Proceedings paper

2010, Extreme Ultraviolet (EUV) Lithography, 21/02/2010, p.763627

Publication

Evaluation of the mask topography effect on te OPC modeling of hole patterns

Ward, Brian

Proceedings paper

2008, Optical Microlithography XXI, 26/02/2008, p.69243S

Publication

Exploration of etch step interactions in the dual patterning process for process modeling

Melvin, Lawrence

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Ward, Brian

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Song, H.

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Rhie, S.U.

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Lucas, K.D.

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Wiaux, Vincent

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Verhaegen, Staf

Journal article

2008, Journal of Vacuum Science and Technology B, (26) 6, p.2434-2434

Publication

Flare mitigation strategies in extreme ultraviolet lithography

Kim, Insung

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Myers, Alan

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Melvin, Lawrence

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Ward, Brian

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Lorusso, Gian

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Jonckheere, Rik

Journal article

2008, Microelectronic Engineering, (85) 5_6, p.738-743

Browsing by Author "Ward, Brian"