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Evaluation of the mask topography effect on te OPC modeling of hole patterns
Publication:
Evaluation of the mask topography effect on te OPC modeling of hole patterns
Date
2008
Proceedings Paper
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19790.pdf
1.21 MB
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Ward, Brian
Journal
Abstract
Description
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1835
since deposited on 2021-10-17
Acq. date: 2025-10-23
Citations
Metrics
Views
1835
since deposited on 2021-10-17
Acq. date: 2025-10-23
Citations