Evaluation of the mask topography effect on te OPC modeling of hole patterns

dc.contributor.author	Ward, Brian
dc.date.accessioned	2021-10-17T12:44:16Z
dc.date.available	2021-10-17T12:44:16Z
dc.date.embargo	9999-12-31
dc.date.issued	2008
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/14779
dc.source.beginpage	69243S
dc.source.conference	Optical Microlithography XXI
dc.source.conferencedate	26/02/2008
dc.source.conferencelocation	San Jose, CA USA
dc.title	Evaluation of the mask topography effect on te OPC modeling of hole patterns
dc.type	Proceedings paper
dspace.entity.type	Publication
Files	Original bundle Name: 19790.pdf Size: 1.21 MB Format: Adobe Portable Document Format Download
Publication available in collections:	Conference contributions

Date