Browsing by Author "Wei, Chih-I"
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Publication Better prediction on patterning failure mode with hotspot aware OPC modeling
Proceedings paper2021, Metrology, Inspection, and Process Control for Microlithography XXXIV, 22/02/2021, p.1161112Publication Low Landing Energy as an Enabler for Optimal Contour Based OPC Modeling in the EUV Era
Publication Probability prediction of EUV process failure due to resist-exposure stochastic: applications of Gaussian random fields excursions and Rice's formula
Proceedings paper2020, Extreme Ultraviolet (EUV) Lithography XI; 113230L (2020), 23/02/2020, p.113230L