imec Institutional Repository Browsing {{ collection }} by Author "Wilk, G."

Publication

ALCVD hafnium silicates for low power gate stacks

Maes, Jan

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Laitinen, O.

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De Witte, Hilde

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Deweerd, Wim

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Delabie, Annelies

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Conard, Thierry

Oral presentation

2004, Atomic Layer Deposition Conference

Publication

Atomic layer deposition of hafnium silicate from HfCl4, SiCl4, and H2O

Fedorenko, Yanina

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Swerts, Johan

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Maes, Jan

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Tois, E.

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Haukka, S.

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Wang, C.G

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Wilk, G.

Journal article

2007, Electrochemical and Solid-State Letters, (10) 5, p.H149-H152

Publication

Atomic layer deposition: an enabling technology for microelectronic device manufacturing

Lee, F.

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Marcus, S.

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Shero, E.

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Wilk, G.

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Swerts, Johan

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Maes, Jan

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Blomberg, T.

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Delabie, Annelies

Proceedings paper

2007, IEEE/SEMI Advanced Semiconductor Manufacturing Conference, 11/06/2007, p.359-365

Publication

Impact of Hf-precursor choice on scaling and performance of high-k gate dielectrics

Maes, Jan

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Fedorenko, Yanina

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Proceedings paper

2007, Physics and Technology of High-k Gate Dielectrics 5, 7/10/2007, p.59-72

Publication

Nitrided hafnium silicates for gate dielectrics

Wang, C.G.

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Velasco, H.

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Verghese, M.

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Shero, E.

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Wilk, G.

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Maes, Jan

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Laitinen, O.

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Deweerd, Wim

Meeting abstract

2004, AVS 51st International Symposium, 14/11/2004, p.DI-MoA5

Browsing by Author "Wilk, G."