Browsing by Author "Wise, Rich"
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Publication Dry resist process development toward depth of focus improvement in high NA EUV lithography
Publication High NA: Enabling Single Exposure for Metal Logic Designs
Proceedings paper2026, Optical and EUV Nanolithography XXXIX,, 2026-02-22, p.139791EPublication Integrated approach to improving local CD uniformity in EUV patterning
Proceedings paper2017, Extreme Ultraviolet (EUV) Lithography VIII, 26/02/2017, p.1014319