Browsing by Author "Yamada, Naoki"
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Publication Forming gas anneal induced flat-band voltage shift of metal-oxide-semiconductor stacks and its link with hydrogen incorporation in metal gates
Journal article2007, Microelectronic Engineering, (84) 9_10, p.2213-2216Publication High-k gate stack engineering – towards meeting low standby power and high performance targets
; ; ; ; Proceedings paper2005, Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS: New Materials, Processes, and Equipment, 15/05/2005, p.109-117Publication Influence of metal capping layer on the work function of Mo gated metal-oxide semiconductor stacks
Journal article2008, Applied Physics Letters, (93) 8, p.83511Publication Investigation on molybdenum and its conductive oxides as p-type metal gate candidates
Journal article2008, Journal of the Electrochemical Society, (155) 7, p.H481