Browsing by Author "Yildirim, Oktay"
Now showing 1 - 6 of 6
- Results Per Page
- Sort Options
Publication Etch tool pressure optimization enabling wafer edge overlay control.
Oral presentation2020, ASML Technology Conference 2020Publication Impact of acid statistics on EUV local critical dimension uniformity
Proceedings paper2017, Extreme Ultraviolet (EUV) Lithography, 27/02/2017, p.1014323Publication Intra-field etch induced overlay penalties
Proceedings paper2020, Advanced Etch Technology for Nanopatterning IX, 23/02/2020, p.1132910Publication Mitigation of the etch-induced intra-field overlay contribution
Publication On product overlay characterization after stressed layer etch
Proceedings paper2021, Advanced Etch Technology and Process Integration for Nanopatterning X, 21/02/2021, p.116150NPublication The mask contribution as part of the intra-field on-product overlay performance
; ;