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Browsing by Author "Yoshida, Y."

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    Selective wet etching in fabricating SiGe and Ge nanowires for gate-all-around MOSFETs

    Liu, W.D.
    ;
    Lee, Y.C.
    ;
    Sekiguchi, R.
    ;
    Yoshida, Y.
    ;
    Komori, K.
    ;
    Wostyn, Kurt  
    ;
    Sebaai, Farid  
    Proceedings paper
    2018, Ultra Clean Processing of Semiconductor Surfaces XIV - UCPSS, 3/09/2018, p.101-106
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    Surface preparation and wet cleaning for germanium surface

    Shirakawa, Hajime
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    Snow, j.
    ;
    Otsuji, M.
    ;
    Yoshida, Y.
    ;
    Takahashi, H.
    ;
    Sebaai, Farid  
    Proceedings paper
    2017, Surface Preparation and Cleaning Conference - SPCC, 28/03/2017, p.170-180

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