Browsing by Author "Yoshihara, K."
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Publication EUV resist chemical gradient enhancement by UV flood exposure for improvement in EUV resist resolution, process control, roughness, sensitivity and stochastic defectivity
Proceedings paper2020, Advances in Patterning Materials and Processes XXXVII, 24/02/2020, p.113260APublication Investigation of EUV process sensitivities for wafer track processing
Proceedings paper2009, Alternative Lithographic Technologies, 22/02/2009, p.727148