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    The impact of stacked cap layers on effective work function with HfSiON and SiON gate dielectrics

    Cho, Hag-Ju
    ;
    Yu, Hong Yu
    ;
    Chang, Vincent S.
    ;
    Akheyar, Amal
    ;
    Jakschik, Stefan
    ;
    Conard, Thierry  
    Journal article
    2008-07, IEEE Electron Device Letters, (29) 7, p.743-745

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