Publication:

The impact of stacked cap layers on effective work function with HfSiON and SiON gate dielectrics

Date

2008-07

Journal article

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Author(s)

;

;

Chang, Vincent S.

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;

Jakschik, Stefan

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Conard, Thierry

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Hantschel, Thomas

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Delabie, Annelies

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Adelmann, Christoph

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Van Elshocht, Sven

;

Ragnarsson, Lars-Ake

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;

Absil, Philippe

;

Biesemans, Serge

Journal

IEEE Electron Device Letters

Metrics

1879 since deposited on 2021-10-17

Acq. date: 2025-12-10