Browsing by Author "Zhang, Haodong"

A chemisorbed interfacial layer for seeding atomic layer deposition on graphite

Assessing the prospects of atomic layer deposition for two-dimensional materials in microelectronic applications

Atomic layer processing of 2D materials for beyond CMOS applications

Challenges and opportunities for Atomic Layer Deposition of 2D transition metal dichalcogenides

Chemical vapor deposition of 2D tin sulfides using SnCl4 and H2S

Formation mechanism of 2D SnS2 and SnS by chemical vapor deposition using SnCl4 and H2S

Formation mechanism of 2D SnS2 bycvd using SnCl4 and H2S

Insight in nucleation mechanisms of semiconducting 2D metal sulfides and application to area selective deposition

MoS2 functionalization with a Sub-nm thin SiO2 layer for atomic layer deposition of high-k dielectrics

Nucleation and growth mechanism of 2d SnS2 by chemical vapor deposition: initial 3D growth followed by 2D lateral growth

Nucleation and Growth Mechanisms of 2D Semiconductor/high-k Dielectric Heterostacks

Nucleation and growth mechanisms of Al2O3 ALD on synthetic polycrystalline MoS2

Nucleation mechanisms for chemical vapor deposition and atomic layer deposition of 2D semiconductor materials

Nucleation of Al2O3 atomic layer deposition on MoS2, a two-dimensional semiconductor

Structural characterization of CVD SnS layers

Structural characterization of SnS crystals formed by chemical vapour deposition