Skip to content
Institutional repository
Communities & Collections
Browse all items
Scientific publications
Open knowledge
Log In
imec Publications
Articles
MoS2 functionalization with a Sub-nm thin SiO2 layer for atomic layer deposition of high-k dielectrics
Publication:
MoS2 functionalization with a Sub-nm thin SiO2 layer for atomic layer deposition of high-k dielectrics
Copy permalink
Date
2017
Journal article
Simple item page
Full metadata
Statistics
Loading...
Loading...
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Zhang, Haodong
;
Arutchelvan, Goutham
;
Meersschaut, Johan
;
Gaur, Abhinav
;
Conard, Thierry
;
Bender, Hugo
;
Lin, Dennis
;
Asselberghs, Inge
;
Heyns, Marc
;
Radu, Iuliana
;
Vandervorst, Wilfried
;
Delabie, Annelies
Journal
Chemistry of Materials
Abstract
Description
Metrics
Views
1963
since deposited on 2021-10-24
1
last month
Acq. date: 2025-12-11
Citations
Metrics
Views
1963
since deposited on 2021-10-24
1
last month
Acq. date: 2025-12-11
Citations