Publication:

MoS2 functionalization with a Sub-nm thin SiO2 layer for atomic layer deposition of high-k dielectrics

Date

2017

Journal article

Simple item page Full metadata Statistics

Author(s)

;

Arutchelvan, Goutham

;

Meersschaut, Johan

;

;

Conard, Thierry

;

;

;

Asselberghs, Inge

;

;

;

Vandervorst, Wilfried

;

Delabie, Annelies

Journal

Chemistry of Materials

Statistics

1965 since deposited on 2021-10-24

2last month

Acq. date: 2026-01-26