MoS2 functionalization with a Sub-nm thin SiO2 layer for atomic layer deposition of high-k dielectrics

Zhang, Haodong; Arutchelvan, Goutham; Meersschaut, Johan; Gaur, Abhinav; Conard, Thierry; Bender, Hugo; Lin, Dennis; Asselberghs, Inge; Heyns, Marc; Radu, Iuliana; Vandervorst, Wilfried; Delabie, Annelies

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MoS2 functionalization with a Sub-nm thin SiO2 layer for atomic layer deposition of high-k dielectrics

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2017

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Vandervorst, Wilfried

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Delabie, Annelies

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Chemistry of Materials

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Acq. date: 2026-08-04

MoS2 functionalization with a Sub-nm thin SiO2 layer for atomic layer deposition of high-k dielectrics

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