Browsing by Author "Zhong, L."
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Publication A static model for scratches generated during aluminum chemical-mechanical polishing process: orbital technology
Journal article1999, Japanese Journal of Applied Physics. Part 1: Regular Papers, (38) 4A, p.1932-1938Publication Characterization of slurry system and suppression of oxide erosion in aluminun CMP (chemical-mechanical planarization)
Proceedings paper2000, Chemical-Mechanical Polishing - Fundamentals and Challenges, 5/04/1999, p.115-120