Browsing by Author "Zimmerman, John"

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Impact of an etched EUV mask black border on imaging and overlay

de Kruif, Rob
;
Davydova, Natalia
;
Connolly, Brid
;
Fukugami, Norihito
;
Lammers, Ad
Oral presentation
2012, International Symposium on Extreme Ultraviolet Lithography - EUVL
Performance of the full field EUV systems

Meiling, Hans
;
Boon, Edwin
;
Buzing, Nico
;
Cummings, Kevin
;
Frijns, Olav
;
Galloway, Judy
Proceedings paper
2008, Emerging Lithographic Technologies XII, 24/02/2008, p.69210L