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Browsing by Author "van Putten, Michel"

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    First results of EUV-scanner compatibility tests performed on novel 'high-NA' reticle absorber materials

    Stortelder, Jetske
    ;
    Ebeling, Robert P.
    ;
    Rijnsent, Corne
    ;
    van Putten, Michel
    Proceedings paper
    2021, International Conference on Extreme Ultraviolet Lithography, SEP 27-OCT 01, 2021, p.1185414
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    Lifetime test on EUV photomask with EBL2

    Wu, Chien-ching
    ;
    Bender, Markus
    ;
    Jonckheere, Rik  
    ;
    Scholze, Frank
    ;
    Bekman, Herman
    Proceedings paper
    2019-05, Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology, 16/04/2019, p.111780E

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