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Browsing by Author "van Rhee, Tasja"

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    LCDU decomposition and scaling: mask and resist effects on local MEEF and stochastics

    Gustas, Dominykas
    ;
    Borman, Sam
    ;
    Oorschot, Dorothe
    ;
    Bekaert, Joost  
    ;
    Van Loo, Hilbert
    Proceedings paper
    2024, 2024 International Conference on Extreme Ultraviolet Lithography, SEP 30-OCT 03, 2024, p.Art. 132150Q

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