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Browsing by Author "van der Hilst, J. B. C."

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    Bottom-ARC optimization methodology for 0.25μm lithography and beyond

    Op de Beeck, Maaike  
    ;
    Vandenberghe, Geert  
    ;
    Jaenen, Patrick  
    ;
    Feng, Hong Zhang
    ;
    Delvaux, Christie  
    Proceedings paper
    1998, Optical Microlithography XI, 25/02/1998, p.322-336
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    Optimisation of bottom-ARC processes with respect to CD control

    Op de Beeck, Maaike  
    ;
    Vandenberghe, Geert  
    ;
    Jaenen, Patrick  
    ;
    Zhang, Fenghong
    ;
    Delvaux, Christie  
    Journal article
    1998, Future Fab International, 5, p.205-210

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