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Bottom-ARC optimization methodology for 0.25μm lithography and beyond
Publication:
Bottom-ARC optimization methodology for 0.25μm lithography and beyond
Date
1998
Proceedings Paper
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3107.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Op de Beeck, Maaike
;
Vandenberghe, Geert
;
Jaenen, Patrick
;
Feng, Hong Zhang
;
Delvaux, Christie
;
Richardson, Paul
;
Van Puyenbroeck, Ilse
;
Ronse, Kurt
;
Lamb, J. E.
;
van der Hilst, J. B. C.
;
van Wingerden, Johannes
Journal
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2
since deposited on 2021-10-01
Acq. date: 2025-10-23
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2029
since deposited on 2021-10-01
Acq. date: 2025-10-23
Citations