Publication:

Bottom-ARC optimization methodology for 0.25μm lithography and beyond

Date

1998
Proceedings Paper
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dc.contributor.authorOp de Beeck, Maaike
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorJaenen, Patrick
dc.contributor.authorFeng, Hong Zhang
dc.contributor.authorDelvaux, Christie
dc.contributor.authorRichardson, Paul
dc.contributor.authorVan Puyenbroeck, Ilse
dc.contributor.authorRonse, Kurt
dc.contributor.authorLamb, J. E.
dc.contributor.authorvan der Hilst, J. B. C.
dc.contributor.authorvan Wingerden, Johannes
dc.contributor.imecauthorOp de Beeck, Maaike
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorJaenen, Patrick
dc.contributor.imecauthorDelvaux, Christie
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecOp de Beeck, Maaike::0000-0002-2700-6432
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.accessioned2021-10-01T08:37:47Z
dc.date.available2021-10-01T08:37:47Z
dc.date.embargo9999-12-31
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2840
dc.source.beginpage322
dc.source.conferenceOptical Microlithography XI
dc.source.conferencedate25/02/1998
dc.source.conferencelocationSanta Clara, CA USA
dc.source.endpage336
dc.title

Bottom-ARC optimization methodology for 0.25μm lithography and beyond

dc.typeProceedings paper
dspace.entity.typePublication
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