Browsing by author "Lamagna, Luca"
Now showing items 1-6 of 6
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Al2O3 stacks on In0.53Ga0.47As substrates: In situ investigation of the interface
Fusi, Matteo; Lamagna, Luca; Spiga, Sabina; Fanciulli, Marco; Brammertz, Guy; Merckling, Clement; Meuris, Marc; Molle, Alessandro (2011) -
Effects of surface passivation during atomic layer deposition of Al2O3 on In0.53Ga0.47As substrates
Lamagna, Luca; Fusi, Matteo; Spiga, Sabina; Fanciulli, Marco; Brammertz, Guy; Merckling, Clement; Meuris, Marc; Molle, Alessandro (2011) -
Improved performance of In0.53Ga0.47As-based metal-oxide-semiconductor capacitors with Al:ZrO2 gate dielectric grown by atomic layer deposition
Molle, Alessandro; Lamagna, Luca; Wiemer, Claudia; Spiga, Sabina; Fanciulli, Marco; Merckling, Clement; Brammertz, Guy; Caymax, Matty (2011) -
Interface analysis of Ge ultra thin layers intercalated between GaAs substrates and oxide stacks
Molle, Alessandro; Lamagna, Luca; Spiga, Sabina; Fanciulli, Marco; Brammertz, Guy; Meuris, Marc (2010) -
Interface quality of atomic layer deposited La-doped ZrO2 films on Ge-passivated In0.15Ga0.85As substrates
Molle, Alessandro; Brammertz, Guy; Lamagna, Luca; Spiga, Sabina; Meuris, Marc; Fanciulli, Marco (2009) -
Reconstruction dependent reactivity of As-decapped In0.53Ga0.47As(001) surfaces and its influence on the electrical quality of the interface with Al2O3 grown by atomic layer deposition
Molle, Alessandro; Lamagna, Luca; Grazianetti, C.; Brammertz, Guy; Merckling, Clement; Caymax, Matty; Spiga, Sabina; Fanciulli, Marco (2011)