Browsing by author "Dekoster, J."
Now showing items 1-7 of 7
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Effects of growth parameters on the epitaxy of CoSi2//Si(100) formed by reactive deposition epitaxy
Vantomme, Andre; Degroote, S.; Dekoster, J.; Bender, Hugo; Langouche, G. (1996) -
Influence of intensity noise spectrum-sliced WDM systems
Zhao, M.; Morthier, Geert; Dekoster, J.; Moeyersoon, Bart; Baets, Roel (2001) -
Intensity noise reduction in spectrum-sliced WDM systems using saturated gain-clamped SOA
Zhao, M.; Morthier, Geert; Dekoster, J.; Baets, Roel (2000) -
Investigation of the intensity noise reduction using a saturated semiconductor optical amplifier in spectrum sliced WDM systems
Zhao, M.; Morthier, Geert; Baets, Roel; Dekoster, J. (2001) -
RTA-preparation of b-FeSi2 layers from MBE-grown FeSi films deposited on SiGe(100) substrates
Libezny, Milan; Poortmans, Jef; Dekoster, J.; Degroote, S.; Vantomme, Andre; de Lange, B. G. M.; Langouche, G.; Nijs, Johan (1995) -
Synthesis of CoxFe1-xSi2 with high dose ion implantation and reactive codeposition epitaxy
Vantomme, Andre; Wu, Ming Fang; Degroote, S.; Dekoster, J.; Langouche, G.; Tavares, J.; Bender, Hugo (1995) -
Synthesis of CoxFe1-xSi2 with High-Dose Ion Implantation and Reactive Codeposition Epitaxy
Vantomme, Andre; Wu, Ming Fang; Degroote, S.; Dekoster, J.; Langouche, G.; Tavares, J.; Bender, Hugo (1994)