Browsing by author "Malhouitre, Stephane"
Now showing items 1-8 of 8
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Advanced wafer surface cleaning technology
Mertens, Paul; Vos, Rita; Vereecke, Guy; Arnauts, Sophia; Bearda, Twan; De Waele, Rita; Eitoku, Atsuro; Fyen, Wim; Geckiere, J.; Hellin, David; Holsteyns, Frank; Kesters, Els; Claes, Martine; Kenis, Karine; Kraus, Harald; Malhouitre, Stephane; Lee, Kuntack; Kocsis, Michael; Onsia, Bart; Garaud, Sylvain; Rip, Jens; Snow, Jim; Teerlinck, I.; Van Hoeymissen, Jan; Barbagini, Francesca; Xu, Kaidong; Paraschiv, Vasile; De Gendt, Stefan; Mannaert, Geert; Heyns, Marc (2004) -
Etching of thermal SiO2 in supercritical CO2
Malhouitre, Stephane; Van Hoeymissen, Jan; Case, Carlye; Granger, Pascal (2007) -
Impact of CO2 cryogenic pre-treatment on ion impanted photresist wet cleaning
Malhouitre, Stephane; Vos, Rita; Banerjee, Souvik; Bearda, Twan; Mertens, Paul (2008) -
Post ion-implant photoresist removal via wet chemical cleans combined with physical force pretreatments
Totir, George; Frank, Martin M.; Vos, Rita; Arnauts, Sophia; Bearda, Twan; Kenis, Karine; Delande, Tinne; Le, Quoc Toan; Kesters, Els; Vereecke, Guy; Mannaert, Geert; Lux, Marcel; Hoflijk, Ilse; Conard, Thierry; Banerjee,; Malhouitre, Stephane; Leunissen, Peter; Mertens, Paul (2007) -
Repair and sealing of mesoporous low-k dielectric by supercritical CO2 processing
Malhouitre, Stephane; Van Hoeymissen, Jan; Le, Quoc Toan; Kesters, Els; Granger, P. (2005) -
ScCO2-based processes in semiconductor manufacturing: Why did it fail ?
Van Hoeymissen, Jan; Malhouitre, Stephane (2008) -
Stripping of ion implanted photoresist by Co2 cryogenic pre-treatment followed by wet cleaning
Malhouitre, Stephane; Vos, Rita; Banerjee, Souvik; Bearda, Twan; Mertens, Paul (2008) -
Supercritical CO2 low-k dielectric repair
Malhouitre, Stephane; Van Hoeymissen, Jan; Muscat, Anthony; Granger, Pascal; Mertens, Paul (2005)