Authors

Totir, George; Frank, Martin M.; Vos, Rita; Arnauts, Sophia; Bearda, Twan; Kenis, Karine; Delande, Tinne; Le, Quoc Toan; Kesters, Els; Vereecke, Guy; Mannaert, Geert; Lux, Marcel; Hoflijk, Ilse; Conard, Thierry; Banerjee,; Malhouitre, Stephane; Leunissen, Peter; Mertens, Paul

Conference

Cleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 10

Title

Post ion-implant photoresist removal via wet chemical cleans combined with physical force pretreatments

Publication type

Proceedings paper

Embargo date

9999-12-31