Browsing by author "Gao, Weimin"
Now showing items 1-4 of 4
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Double patterning at NA 0.33 versus high-NA single exposure in EUV lithography: an imaging comparison
Gao, Weimin; Wiaux, Vincent; Hoppe, Wolfgang; Philipsen, Vicky; Melvin, Lawrence; Hendrickx, Eric; Lucas, Kevin; Kim, Ryan Ryoung han (2018) -
Experimental characterization of NTD rResist shrinkage
Kuchler, Bernd; Mulders, Thomas; Taoka, Hironobu; Gao, Weimin; Klostermann, Ulrich; Kamimura, Sou; Grozev, Grozdan; Masahiro, Yoshidome; Shirakawa, Michihiro; Li, Waikin (2017) -
Experimental validation of stochastic modeling for negative-tone develop EUV resist
Kamohara, Itaru; Gao, Weimin; Klostermann, Ulrich; Schmöller, Thomas; Demmerle, Wolfgang; Lucas, Kevin; De Simone, Danilo; Hendrickx, Eric; Vandenberghe, Geert (2015) -
Modeling EUVL patterning variability for metal layers in 5nm technology node and its effect on electrical resistance
Gao, Weimin; Blanco, Victor; Philipsen, Vicky; Kamohara, Itaru; Saad, Yves; Ciofi, Ivan; Melvin, Lawrence; Hendrickx, Eric; Wiaux, Vincent; Kim, Ryan Ryoung han (2017)