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Modeling EUVL patterning variability for metal layers in 5nm technology node and its effect on electrical resistance
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Authors
Gao, Weimin
;
Blanco, Victor
;
Philipsen, Vicky
;
Kamohara, Itaru
;
Saad, Yves
;
Ciofi, Ivan
;
Melvin, Lawrence
;
Hendrickx, Eric
;
Wiaux, Vincent
;
Kim, Ryan Ryoung han
DOI
10.1117/12.2259964
Conference
Extreme Ultraviolet (EUV) Lithograpgy VIII
Title
Modeling EUVL patterning variability for metal layers in 5nm technology node and its effect on electrical resistance
Publication type
Proceedings paper
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