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Modeling EUVL patterning variability for metal layers in 5nm technology node and its effect on electrical resistance
Publication:
Modeling EUVL patterning variability for metal layers in 5nm technology node and its effect on electrical resistance
Date
2017
Proceedings Paper
https://doi.org/10.1117/12.2259964
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Gao, Weimin
;
Blanco, Victor
;
Philipsen, Vicky
;
Kamohara, Itaru
;
Saad, Yves
;
Ciofi, Ivan
;
Melvin, Lawrence
;
Hendrickx, Eric
;
Wiaux, Vincent
;
Kim, Ryan Ryoung han
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1971
since deposited on 2021-10-24
415
item.page.metrics.field.last-week
Acq. date: 2025-10-25
Citations
Metrics
Views
1971
since deposited on 2021-10-24
415
item.page.metrics.field.last-week
Acq. date: 2025-10-25
Citations