Publication:

Modeling EUVL patterning variability for metal layers in 5nm technology node and its effect on electrical resistance

Date

2017
Proceedings Paper
https://doi.org/10.1117/12.2259964
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dc.contributor.authorGao, Weimin
dc.contributor.authorBlanco, Victor
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorKamohara, Itaru
dc.contributor.authorSaad, Yves
dc.contributor.authorCiofi, Ivan
dc.contributor.authorMelvin, Lawrence
dc.contributor.authorHendrickx, Eric
dc.contributor.authorWiaux, Vincent
dc.contributor.authorKim, Ryan Ryoung han
dc.contributor.imecauthorGao, Weimin
dc.contributor.imecauthorBlanco, Victor
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorCiofi, Ivan
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.imecauthorKim, Ryan Ryoung han
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.contributor.orcidimecCiofi, Ivan::0000-0003-1374-4116
dc.date.accessioned2021-10-24T04:55:09Z
dc.date.available2021-10-24T04:55:09Z
dc.date.issued2017
dc.identifier.doi10.1117/12.2259964
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28369
dc.source.beginpage101430I
dc.source.conferenceExtreme Ultraviolet (EUV) Lithograpgy VIII
dc.source.conferencedate26/02/2017
dc.source.conferencelocationSan Jose, CA USA
dc.title

Modeling EUVL patterning variability for metal layers in 5nm technology node and its effect on electrical resistance

dc.typeProceedings paper
dspace.entity.typePublication
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