Now showing items 1-3 of 3

    • Improving CMOS performance by AVD® grown high-k dielectrics and advanced metal electrodes 

      Weber, U.; Boissière, O.; Lindner, J.; Schuhmacher, M.; Lehnen, Peer; Manke, C.; Van Elshocht, Sven; Caymax, Matty; Cosnier, V.; McEntee, T. (2005)
    • Issues, achievements and challenges towards intergration of high-k dielectrics 

      Heyns, Marc; Bender, Hugo; Caymax, Matty; Carter, R; Claes, Martine; Conard, Thierry; Boullart, Werner; De Gendt, Stefan; Degraeve, Robin; Deweerd, Wim; Groeseneken, Guido; Houssa, Michel; Kubicek, Stefan; Lujan, Guilherme; Nohira, H.; Pantisano, Luigi; Petry, Jasmine; Röhr, Erika; Vandervorst, Wilfried; Van Elshocht, Sven; Xu, Zhen; Zhao, Chao; Cartier, E.; Chen, J.; Cosnier, V.; Green, M.; Jang, S.E.; Kaushik, Vidya; Kerber, A.; Kluth, J.; Lin, S.; Tsai, Wilman; Young, Edward; Manabe, Y. (2002)
    • Thermal stability of high k layers 

      Zhao, Chao; Cosnier, V.; Chen, P.J.; Richard, Olivier; Roebben, G.; Maes, Jan; Van Elshocht, Sven; Bender, Hugo; Young, Edward; Van der Biest, O.; Caymax, Matty; Vandervorst, Wilfried; De Gendt, Stefan; Heyns, Marc (2003)